High quality polishing slurries and powders for Precision polishing applications
Fully formulated aluminum oxide based polishing slurry for use on sapphire substrates. The combination of high purity alumina and additives are optimized for performance and excellent dispersion, providing fast removal rate and excellent surface quality characteristics.
Highly concentrated Cerium Oxide polishing compound developed with a special formulation to achieve an unusually high stock removal rate while maintaining good suspension characteristics. Recommended for all mass production ophthalmic applications.